Over the years, it is highly demanded for new energy technologies, which can provide clean and environmentally friendly solutions, to alleviate the impact of greenhouse-gases on the global environment. To make more efficient use of energy, electrochemical energy systems offer promising approaches and play key roles in energy sustainability. In a typical electrochemical process, the interfacial properties between the electrodes and electrolytes, such as the structures and morphologies, have great influence on the device performance. In order to well control the process and understand the growth mechanism of different morphologies, in this study a numerical model is utilized to investigate the formation and evolution of thin films during electrochemical deposition (ECD). The alterable parameters affecting the nucleation and growth process of thin films, such as the current, temperature, additive and pH, are taken into consideration in the model. The influence of these parameters on the formation and evolution of characteristic morphologies during ECD are also demonstrated in the simulations. Depending on the growth factors, such as the growth rate, substrate interfacial energy, etc., different types of the microstructures have been reconstructed and characterized with different growth mechanisms. According to the calculation results, a featured surface with flattened morphology is generally driven by the surface diffusion, while the factor of the deposition kinetics is inclined to roughen the surface of thin films. The ultimate aim of this research is attempted to establish a theoretical model of electrochemical deposition process to enhance the development of electrochemical energy applications.