Date/Time: 04-05-2018 - Thursday - 05:00 PM - 07:00 PM
Xianchao Liu1 Jun Wang1

1, University of Electronic Science and Technology of China, Chengdu, , China

Microsphere photolithography, owing to microsphere lenses’ excellent focusing properties and adjusting light scattering, has proved to be a good candidate for fabrication of large-area tunable surface nanopattern arrays[1,2]. Here, close-packed and non-close-packed Mie resonance microsphere photolithography are studied. Different patterns on photoresist surface are obtained theoretically by adjusting optical coupling among neighboring spheres with different gap sizes. The effect of light reflection from the substrate on the pattern produced on the photoresist with a thin thickness is also discussed. Sub-micron hexagonal star-shaped and ring-shaped patterns arrays are achieved with close-packed spheres arrays and spheres arrays with big gaps, respectively. Changing of star-shaped vertices is induced by different polarization of illumination. Experimental results agree well with the simulation. By using smaller resonance spheres, sub-400nm star-shaped and ring-shaped patterns can be realized. These tunable patterns are different from results of previous reports of microsphere photolithography, and the suggested methods are much easy than microsphere assisted lithography to obtain star-shaped and ring-shaped patterns arrays[3], which can find application in biosensor and optic devices.
[1] Wu, W.; Katsnelson, A.; Memis, O. G.; Mohseni, H. A deep sub-wavelength process for the formation of highly uniform arrays of nanoholes and nanopillars. Nanotechnology 2007, 18, 485302.
[2] Chang, Y. C.; Lu, S. C.; Chung, H. C.; Wang, S. M.; Tsai, T. D.; Guo, T. F. High-throughput nanofabrication of infra-red and chiral metamaterials using nanospherical-lens lithography. Scientific Reports 2013, 3, 3339.
[3] Sun, Z. Q.; Yang, L.; Zhang, J. H.; Li, Y. F.; Zhao, Z. H.; Zhang, K.; Zhang, G.; Guo, J. R.; Yang, B. A Universal Approach to Fabricate Various Nanoring Arrays Based on a Colloidal-Crystal-Assisted-Lithography Strategy. Advanced Functional Materials 2008, 18, 4036-4042.

Meeting Program

5:00 PM–7:00 PM Apr 5, 2018 (America - Denver)

PCC North, 300 Level, Exhibit Hall C-E