MA03.05.01 : Large-Area Nano-Imprint Lithography Using Scanning Probe Microscopy

5:00 PM–7:00 PM Apr 4, 2018 (America - Denver)

PCC North, 300 Level, Exhibit Hall C-E

Sooun Lee1 Gwangmook Kim1 Hyunmin Kim1 Hyesoo Kim1 Wooyoung Shim1

1, Yonsei University, Seoul, , Korea (the Republic of)

Recent, many lithography methods using scanning probe microscopy (SPM) have been reported. In particular, experiments were conducted using atomic force microscopy (AFM) software designed for lithographic purpose. These methods have led to the achievement of high resolution and low cost. However, there is still a throughput challenge due to limitation of cantilever-based scanning probe system. Additionally, the recent significant issues are miniaturization and high integration of various devices. The nano-scale materials are excellent solutions for these issues. However, the controlled assembly of nanowire is a key challenge in the development of a range of bottom-up device. Nano-scale combing assembly technique can be a solution. However, nano-scale combing technique needs electron-beam (e-beam) lithography accordingly it also causes high cost and throughput problem. Here, we present new lithographic method overcome these two issues. This method deals with the problems by combining the nano-scale combing technique with the hard-tip, soft-spring lithography method. We proceeded with lithography by attaching the hard tip arrays of a centimeter-scale to a scanning probe microscopy instead of a cantilever. High-throughput large-area patterns of nano-scale were obtained using this method. Additionally, assembly of nanowire can be achieved by combining this patterning process with nano-scale combing technique without e-beam lithography.