The development of simple solution based techniques for the formation of graphene oxide (GO) films onto conductive substrates is of great interest for the rapid development of electrically active and chemically resistant coatings. This work demonstrates the controlled formation of metal-ion-containing GO films using a new deposition approach based on pulsed-potential and alternating current electrocoagulation (EC) and subsequent electrophoretic deposition (EPD) of GO particles on copper electrodes. Specifically, films were deposited from GO based aqueous dispersions using an electrochemical set up in which copper is used as the anode. Based on the choice of the key experimental variables namely frequency (5-50000Hz), amplitude (2-10V), and duty cycle (5-75%), films of controllable thickness (1-100 microns), microstructure and composition (i.e. GO and copper) were readily obtained. The deposited films consisted of two distinct regions: region I, with randomly oriented GO assemblies and region II consisting of oriented lamellar GO assemblies. Of particular interest was the fact that the spatial extent of region I was highly tunable for specific combinations of the experimental variables (low frequency, low duty cycles), while the relative amount of metal-ion incorporation was dependent on the amplitude. The findings of this work enable controllable pathways towards obtaining ordered lamellar assemblies of metal incorporated GO films and coatings, which are of great technological importance impacting diverse research areas that include filtration membranes, electrochemical energy storage, corrosion and electronic packaging.